Spectroscopic characterization of thermally treated Si-rich oxynitride films deposited by PECVD on silicon substrate
Spectroscopic characterization of thermally treated Si-rich oxynitride films deposited by PECVD on silicon substrate
MARIOTTO, Gino;Daldosso, Nicola;
2004-01-01
Abstract
Spectroscopic characterization of thermally treated Si-rich oxynitride films deposited by PECVD on silicon substrate
File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
