Enhanced Photoluminescence at λ = 1.54 μm in the Cu-Doped Er:SiO2 System

Cattaruzza, E.; Battaglin, G.; Visentin, F.; Trave, E.; Aquilanti, G.; Mariotto, G.

doi:10.1021/jp306487a

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The radiofrequency magnetron sputtering codeposition is a versatile technique to obtain Er-doped glass films, i.e., optical materials characterized by the emission of an intense photoluminescence signal at λ = 1.54 μm, the most exploited wavelength for optical telecommunications through fiberglass. After the optimization of this radiative emission in the Er:SiO2 systems, strong sensitizing effects in Cu-doped Er:SiO2 glass systems were evidenced and investigated. Experimental findings suggested that the main energy-transfer mechanism in the metal-doped Er:SiO2 system could be related only to the very small size (less than 1−2 nm) of the doping aggregates and not dependent on their composition.

Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11562/464341

Titolo:	Enhanced Photoluminescence at λ = 1.54 μm in the Cu-Doped Er:SiO2 System
Autori interni:	MARIOTTO, Gino
Data di pubblicazione:	2012
Rivista:	JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES
Abstract:	The radiofrequency magnetron sputtering codeposition is a versatile technique to obtain Er-doped glass films, i.e., optical materials characterized by the emission of an intense photoluminescence signal at λ = 1.54 μm, the most exploited wavelength for optical telecommunications through fiberglass. After the optimization of this radiative emission in the Er:SiO2 systems, strong sensitizing effects in Cu-doped Er:SiO2 glass systems were evidenced and investigated. Experimental findings suggested that the main energy-transfer mechanism in the metal-doped Er:SiO2 system could be related only to the very small size (less than 1−2 nm) of the doping aggregates and not dependent on their composition.
Handle:	http://hdl.handle.net/11562/464341
Appare nelle tipologie:	01.01 Articolo in Rivista

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