An investigation of the voids distribution in hard amorphous carbon nitride films (a-CNx:H) and carbon (a-C:H) films deposited by self-bias glow-discharge was carried out by means of thermal gas evolution analysis and positron annihilation spectroscopy. Internal stress measurements were also performed. Our results for the carbon nitride films indicate a clear correlation between the noticeable reduction of the internal stress of the films and the increase of the voids concentration. The concentration of voids increases with the amount of incorporated nitrogen.
INVESTIGATION OF VOIDS DISTRIBUTION IN AMORPHOUS HYDROGENATED CARBON NITRIDE FILMS BY POSITRON-ANNIHILATION AND THERMAL GAS EVOLUTION EXPERIMENTS
MARIOTTO, Gino;
1994-01-01
Abstract
An investigation of the voids distribution in hard amorphous carbon nitride films (a-CNx:H) and carbon (a-C:H) films deposited by self-bias glow-discharge was carried out by means of thermal gas evolution analysis and positron annihilation spectroscopy. Internal stress measurements were also performed. Our results for the carbon nitride films indicate a clear correlation between the noticeable reduction of the internal stress of the films and the increase of the voids concentration. The concentration of voids increases with the amount of incorporated nitrogen.
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