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EnglishWe report on the fabrication and characterization of planar waveguides in an Er-doped tungsten-tellurite glass by implantation of 3.5 MeV N + ions. Implantations were carried out in a wide fluence range of 1 · 10 16 8 · 10 16 ions/cm 2. Waveguides were characterized by m-line spectroscopy and spectroscopic ellipsometry. Irradiation-induced refractive index modulation saturated around a fluence of 8 · 10 16 ions/cm 2. Waveguides operating at 1550 nm were obtained in that material using 3.5 MeV N + ion implantation. © 2012 IEEE.
http://hdl.handle.net/11562/429174| Titolo: | MeV energy N +-Implanted planar optical waveguides in Er-doped tungsten-tellurite glass operating at 1.55 μm |
| Autori interni: | BETTINELLI, Marco Giovanni SPEGHINI, Adolfo |
| Data di pubblicazione: | 2012 |
| Rivista: | IEEE PHOTONICS JOURNAL |
| Abstract: | We report on the fabrication and characterization of planar waveguides in an Er-doped tungsten-tellurite glass by implantation of 3.5 MeV N + ions. Implantations were carried out in a wide fluence range of 1 · 10 16 8 · 10 16 ions/cm 2. Waveguides were characterized by m-line spectroscopy and spectroscopic ellipsometry. Irradiation-induced refractive index modulation saturated around a fluence of 8 · 10 16 ions/cm 2. Waveguides operating at 1550 nm were obtained in that material using 3.5 MeV N + ion implantation. © 2012 IEEE. |
| Handle: | http://hdl.handle.net/11562/429174 |
| Appare nelle tipologie: | 01.01 Articolo in Rivista |
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