The in-situ metal-organic chemical vapor deposition (MOCVD) growth of Calcium Copper Titanate Oxide (CCTO) films was analyzed using molten multimetal source. Investigations show that the perfect stoichiometry of the CCTO films pointed to the satisfactory behavior of the liquids. The results show the in-situ deposition of CCTO films on LaAlO3 substrates with the help of X-ray and electron transmission diffraction patterns.

A novel approach to synthesizing calcium copper titanate thin films with giant dielectric constants

BETTINELLI, Marco Giovanni;SPEGHINI, Adolfo;
2004-01-01

Abstract

The in-situ metal-organic chemical vapor deposition (MOCVD) growth of Calcium Copper Titanate Oxide (CCTO) films was analyzed using molten multimetal source. Investigations show that the perfect stoichiometry of the CCTO films pointed to the satisfactory behavior of the liquids. The results show the in-situ deposition of CCTO films on LaAlO3 substrates with the help of X-ray and electron transmission diffraction patterns.
CHEMICAL-VAPOR-DEPOSITION; PULSED-LASER DEPOSITION; EPITAXIAL-GROWTH
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11562/305203
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