The in-situ metal-organic chemical vapor deposition (MOCVD) growth of Calcium Copper Titanate Oxide (CCTO) films was analyzed using molten multimetal source. Investigations show that the perfect stoichiometry of the CCTO films pointed to the satisfactory behavior of the liquids. The results show the in-situ deposition of CCTO films on LaAlO3 substrates with the help of X-ray and electron transmission diffraction patterns.
File in questo prodotto:
Non ci sono file associati a questo prodotto.