The results of a recent study on the deposition of calcium copper titanate, CaCu3Ti4O12 (CCTO), thin films on lanthanum alluminate, (001) LaAlO3, substrates by metal-organic chemical vapor deposition (MOCVD) are reported. A molten precursor mixture, consisting of the Ca(hfa)2 tetraglyme, Ti(tmhd)2(O-iPr)2, and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; tetraglyme= 2,5,8,11,14-pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethyl-3,5-heptandione; i-Opr = isopropoxide] precursors, has been employed. The one step route, carried out in the 800-900°C deposition temperature range, has been found unsuited to the formation of the desired CCTO phase, while a two-step MOCVD process leads to the formation of epitaxial CCTO thin films. Film structural and morphological characterization has been carried out by X-ray diffraction (XRD) and scanning electron microscopy (SEM).
MOCVD synthesis of perovskite CaCu3Ti4O12 films
BETTINELLI, Marco Giovanni;SPEGHINI, Adolfo;
2005-01-01
Abstract
The results of a recent study on the deposition of calcium copper titanate, CaCu3Ti4O12 (CCTO), thin films on lanthanum alluminate, (001) LaAlO3, substrates by metal-organic chemical vapor deposition (MOCVD) are reported. A molten precursor mixture, consisting of the Ca(hfa)2 tetraglyme, Ti(tmhd)2(O-iPr)2, and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; tetraglyme= 2,5,8,11,14-pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethyl-3,5-heptandione; i-Opr = isopropoxide] precursors, has been employed. The one step route, carried out in the 800-900°C deposition temperature range, has been found unsuited to the formation of the desired CCTO phase, while a two-step MOCVD process leads to the formation of epitaxial CCTO thin films. Film structural and morphological characterization has been carried out by X-ray diffraction (XRD) and scanning electron microscopy (SEM).
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